Tetramethylammonium hydroxide CAS#75-59-2
CAS Number: 75-59-2
Chemical Formula: C4H13NO
Appearance: Colorless Liquid
Synonyms:
N,N,N-TRIMETHYLMETHANAMINIUM HYDROXIDE
TETRAMETHYLAMMONIUM HYDROXIDE
TMAH
HS Code: 29239000
MOQ (Minimum Order Quantity): 1 FCL (Full Container Load)
Products Description of Tetramethylammonium hydroxide CAS#：75-59-2
Tetramethylammonium hydroxide exists as a solid in its hydrated form or a colorless liquid, characterized by a strong ammonia-like odor. It is soluble in water and exhibits corrosive properties toward metals and biological tissues.
Tetramethylammonium hydroxide Chemical Properties | |
Melting point | °C |
Boiling point | 110 °C |
density | 0.866 g/mL at 25 °C |
vapor pressure | 17.5 mm Hg ( 20 °C) |
refractive index | n20/D 1.384 |
Fp | 80 °F |
storage temp. | Store below +30°C. |
solubility | Methanol (Sparingly), Water (Slightly) |
form | Solution |
color | APHA: ≤10 |
Odor | strong ammonia-like odor |
PH | >13 (H2O, 20°C) |
Water Solubility | Soluble in water. |
Sensitive | Air Sensitive |
Merck | 14,9224 |
BRN | 3558708 |
Stability: | Stable. Flammable. Incompatible with strong oxidizing agents, strong acids. |
InChIKey | WGTYBPLFGIVFAS-UHFFFAOYSA-M |
CAS DataBase Reference | 75-59-2(CAS DataBase Reference) |
EPA Substance Registry System | Tetramethylammonium hydroxide (75-59-2) |
Safety Information
Hazard Codes | C,T,F,T+,Xn |
Risk Statements | 24/25-34-20/21/22-39/23/24/25-23/24/25-10-21/22-25-21-11-67-36-52-48/24-27/28-23-35-36/38 |
Safety Statements | 45-36/37/39-26-16-36/37-28 |
RIDADR | UN 3286 3/PG 2 |
WGK Germany | 1 |
RTECS | PA0875000 |
F | 4.4-10-34 |
TSCA | Yes |
HazardClass | 3 |
PackingGroup | II |
HS Code | 29239000 |
Hazardous Substances Data | 75-59-2(Hazardous Substances Data) |
Product Application of Tetramethylammonium hydroxide CAS#：75-59-2
Tetramethylammonium hydroxide (TMAH) serves multiple industrial and laboratory purposes across various fields.
Key Applications
Used in the synthesis of tetramethylammonium azide.
Acts as an anisotropic etchant for silicon, a basic solvent for developing acidic photoresists in photolithography, a surfactant in ferrofluid synthesis, and a polarographic reagent.
Applied in organosilicon production, functioning as a brightener and cleaning agent for the surface of computer silicon wafers.
Involved in the purification processes of certain metallic elements.
Specific Form Application
A 25 wt.% aqueous solution of tetramethylammonium hydroxide can be utilized as a base for pH adjustment, enabling the preparation of hexagonal mesoporous aluminophosphate (TAP).
Factory and Equipment Show
Fast delivery time
Inventory 2-3 working days New production 7-10 working days
